This ISO standard specifies a test method for self-cleaning performance of semiconducting photocatalytic materials, using water contact angle as an index measured under illumination with ultraviolet light. It targets materials that contain a photocatalyst or have photocatalytic films on the surface (often semiconducting metal oxides such as titanium dioxide).
Dropometer standardizes image capture, baseline detection, and automated reporting for the contact‑angle timepoints defined in your ISO test sequence. It has no built‑in UV lamp or chamber, so the exposure and handling sequence remains an operator‑controlled, SOP‑validated process.
- Static contact angle θ at defined timepoints, with replicates (median + IQR or SD)
- A θ(t) trend (or a derived time‑to‑threshold index) to quantify self-cleaning activity
- Zone tagging or mapping notes when nonuniform response is suspected
Acceptance criteria are site‑specific, establish them with reference samples and controlled challenge modes, and document the rationale. Re‑validate after changes to the UV setup, coating chemistry, fixtures, or handling environment.
Use sessile‑drop geometry on smooth, non‑porous surfaces with controlled reagent water, consistent droplet volume, and consistent timing per your validated method. Follow the current ISO revision used by your lab for the exact sequencing, light dose, and sample handling parameters.
Scope note: the method does not include water-permeable substrates, rough surfaces that do not retain exposed water droplets, highly hydrophobic or superhydrophobic coatings, hydrophobic surfaces where texture dominates wetting, powder or granular materials, or visible light-sensitive photocatalysts.
Run a reference photocatalyst coupon and a non‑photocatalytic blank each batch, verify UV irradiance at the sample plane, and trend a stable reference surface for technique drift. Reject any spot with distorted footprint geometry, unstable baseline, or failed fit/QC flag.